SURFACE ANALYSIS USING COMPLEMENTARY ELECTRONIC AND CHEMICAL MEASUREMENTS

被引：15
作者：
HAAS, GA [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期
关键词：
D O I：
10.1116/1.568903
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：479 / 486
页数：8
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