CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE AT LOW-TEMPERATURES

被引：224

作者：

KURTZ, SR ^{[1
]}

GORDON, RG ^{[1
]}

机构：

[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138

来源：

THIN SOLID FILMS | 1986年 / 140卷 / 02期

关键词：

We should like to thank the Watkins-Johnson Company for use of its nozzle and the Spire Corporation for the hardness tests. We should also like to thank J. Chapple-Sokol; D. Wink and J. Hayes for useful conversations. We gratefully acknowledge financial support from the Solar Energy Research Institute; the National Science Foundation and the Materials Research Laboratory at Harvard University;

D O I：

10.1016/0040-6090(86)90271-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：277 / 290

页数：14