HIGHLY SENSITIVE POSITIVE ELECTRON RESISTS CONSISTING OF HALOGENATED ALKYL ALPHA-CHLOROACRYLATE SERIES POLYMER MATERIALS

被引：17

作者：

TADA, T ^{[1
]}

机构：

[1] VLSI TECHNOL RES ASSOC,COOPERAT LABS,KAWASAKI 213,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 04期

关键词：

D O I：

10.1149/1.2119857

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：912 / 917

页数：6

共 8 条

[1] APPLICATION OF METHYL ALPHA-CHLOROACRYLATE COPOLYMERS AS ELECTRON SENSITIVE POSITIVE RESISTS
LAI, JH
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 8 - 14
[2] STUDIES OF METHYL METHACRYLATE-METHYL ALPHA-CHLOROACRYLATE COPOLYMERS AND POLY(METHYL ALPHA-CHLOROACRYLATE) AS ELECTRON SENSITIVE POSITIVE RESISTS
LAI, JH
SHEPHERD, LT
ULMER, R
GRIEP, C
POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) : 402 - 405
[3] POLY(TRIFLUOROETHYL ALPHA-CHLOROACRYLATE AS A HIGHLY SENSITIVE POSITIVE ELECTRON RESIST
TADA, T
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1829 - 1830
[4] ELECTRON-SENSITIVE RESISTS .2. POSITIVE RESISTS DERIVED FROM HIGH POLYMERS OF METHYL-METHACRYLATE, METHYL ALPHA-CHLOROACRYLATE, AND HEXYL METHACRYLATE
LAI, JH
SHRAWAGI, S
JOURNAL OF APPLIED POLYMER SCIENCE, 1978, 22 (01) : 53 - 58
[5] POSITIVE ELECTRON RESISTS DERIVED FROM HIGH POLYMERS OF METHYL ALPHA CHLOROACRYLATE AND METHACRYLATES
LAI, JH
GRIEP, C
SHEPHERD, LT
ULMER, R
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1977, 174 (SEP): : 7 - 7
[6] POSITIVE ELECTRON-BEAM RESIST BEHAVIOR FOR METHACRYLONITRILE AND METHYL ALPHA-CHLOROACRYLATE POLYMERS AND CO-POLYMERS
LAI, JH
HELBERT, JN
COOK, CF
PITTMAN, CU
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1992 - 1995
[7] HIGHLY SENSITIVE POSITIVE ELECTRON-BEAM RESISTS BY ADDING QUATERNARY AMMONIUM-SALTS
HAMADA, Y
TSUJINO, Y
YAMAZAKI, S
KUROKI, K
KUWANO, Y
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (10) : 2606 - 2610
[8] A Series of Cobalt-Based Coordination Polymer Crystalline Materials as Highly Sensitive Electrochemical Sensors for Detecting Trace Cr(VI), Fe(III) Ions, and Ascorbic Acid
Wang, Yue
Ma, Jian-Xin
Zhang, Yue
Xu, Na
Wang, Xiu-Li
CRYSTAL GROWTH & DESIGN, 2021, 21 (08) : 4390 - 4397

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