IONIZATION AND ATTACHMENT IN BINARY-MIXTURES OF SF6-N2 AND CCL2F2-N2

被引：34
作者：
SIDDAGANGAPPA, MC
LAKSHMINARASIMHA, CS
NAIDU, MS
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1983年 / 16卷 / 05期
关键词：
D O I：
10.1088/0022-3727/16/5/009
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：763 / 772
页数：10
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共 23 条
  • [1] ASCHWANDEN T, 1979, 3RD P INT S HIGH VOL
  • [2] MEASUREMENT OF IONIZATION AND ATTACHMENT COEFFICIENTS IN SULPHUR HEXAFLUORIDE IN UNIFORM FIELDS
    BHALLA, MS
    CRAGGS, JD
    [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1962, 80 (513): : 151 - &
  • [3] MEASUREMENT OF IONIZATION AND ATTACHMENT COEFFICIENTS IN SF6
    BOYD, HA
    CRICHTON, GC
    [J]. PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON, 1971, 118 (12): : 1872 - &
  • [4] A CRITIQUE OF METHODS FOR CALCULATING THE DIELECTRIC STRENGTH OF GAS-MIXTURES
    CHANTRY, PJ
    WOOTTON, RE
    [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2731 - 2739
  • [5] CHRISTOPHOROU LG, 1981, J PHYS D APPL PHYS, V14, P675, DOI 10.1088/0022-3727/14/4/021
  • [6] COOKSON AH, 1980, 2ND P INT S GAS DIEL, P169
  • [7] Ermel M., 1975, Elektrotechnische Zeitschrift ETZ A, V96, P231
  • [8] IMPULSE BREAKDOWN OF NEGATIVE ROD-PLANE GAPS IN HYDROGEN AND HYDROGEN-SF6 MIXTURES
    FARISH, O
    DALE, SJ
    SLETTEN, AM
    [J]. IEEE TRANSACTIONS ON POWER APPARATUS AND SYSTEMS, 1978, 97 (01): : 118 - 124
  • [9] FOLKARD MA, 1973, J PHYS B, V6, P213
  • [10] GEBALLE R, 1955, BASIC PROCESSES GASE, P415
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