DOPING OF GALLIUM-ARSENIDE IN A LOW-PRESSURE ORGANOMETALLIC CVD SYSTEM .1. SILANE

被引：35
作者：
FIELD, RJ
GHANDHI, SK
机构：
来源：
JOURNAL OF CRYSTAL GROWTH | 1986年 / 74卷 / 03期
关键词：
D O I：
10.1016/0022-0248(86)90200-9
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
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页码：543 / 550
页数：8
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