TRANSPARENCY OF THIN METAL-FILMS ON SEMICONDUCTOR SUBSTRATES

被引：22

作者：

HOVEL, HJ ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

关键词：

D O I：

10.1063/1.322504

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4968 / 4970

页数：3

共 9 条

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