DESIGN AND OPTIMIZATION OF MAGNETIC LENSES AND DEFLECTION SYSTEMS FOR ELECTRON-BEAMS

被引:49
作者
MUNRO, E [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期
关键词
D O I
10.1116/1.568477
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1146 / 1150
页数:5
相关论文
共 9 条
[1]  
MUNRO E, 1974, OPTIK, V39, P450
[2]  
Munro E., 1975, IBM Technical Disclosure Bulletin, V17
[3]  
Munro E., 1973, IMAGE PROCESSING COM, P284
[4]  
MUNRO E, 1975, SET COMPUTER PROGRAM
[5]  
OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44
[6]  
PFEIFFER HC, 1972, 5TH P ANN SCANN EL M, P113
[7]  
PFEIFFER HC, 1974, 8TH INT C EL MICR CA, P56
[9]  
1974, SH1253001 IBM PUBL, P362