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- [3] Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation RSC ADVANCES, 2016, 6 (100): : 97720 - 97727
- [6] PROPERTIES OF TANTALUM OXIDE-FILMS DEPOSITED ON SILICON BY CVD AND SPUTTERING DENKI KAGAKU, 1985, 53 (02): : 109 - 113
- [10] STUDY OF THE OXIDE-FILMS ON THE SURFACE OF CADMIUM TELLURIDE JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1987, 60 (11): : 2232 - 2235