RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells

被引：0

作者：

Zakhvalinskii, V. S.

Piljuk, E. A. ^{[1
]}

Goncharov, I. Yu. ^{[1
]}

Rodriges, V. G. ^{[1
]}

Kuzmenko, A. P. ^{[2
]}

Taran, S. V. ^{[1
]}

Abakumov, P. A. ^{[2
]}

机构：

[1] Belgorod Natl Res Univ, 85 Pobedy Str, Belgorod 308015, Russia

[2] South West State Univ, Kursk, Russia

来源：

JOURNAL OF NANO- AND ELECTRONIC PHYSICS | 2014年 / 6卷 / 03期

关键词：

Atomic force microscopy; RF- magnetron sputtering; Silicon carbide; Silicon nitride; Thin films; Solar cells;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.

引用

页数：3

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