HIGH-CURRENT ION-SOURCE

[21] ROSING MG, 1958, J APPL PHYS, V57, P816

[22] METAL-ION SOURCE USING RF DISCHARGE COMBINED WITH SPUTTERING [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1984, 55 (11) : 1760 - 1762

[23] Valyi L, 1977, ATOM ION SOURCES

[24] PRODUCTION OF A DENSE LOW-ENERGY POSITIVE HYDROGEN-ION BEAM [J]. VACUUM, 1984, 34 (1-2) : 25 - 29

[25] 1974, 2ND P S ION SOURC FO

[26] 1983, IEEE T PLASMA SCI, V11

[21] ROSING MG, 1958, J APPL PHYS, V57, P816

[22] METAL-ION SOURCE USING RF DISCHARGE COMBINED WITH SPUTTERING [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1984, 55 (11) : 1760 - 1762

[23] Valyi L, 1977, ATOM ION SOURCES

[24] PRODUCTION OF A DENSE LOW-ENERGY POSITIVE HYDROGEN-ION BEAM [J]. VACUUM, 1984, 34 (1-2) : 25 - 29

[25] 1974, 2ND P S ION SOURC FO

[26] 1983, IEEE T PLASMA SCI, V11