EXCIMER LASER ETCHING OF POLYMERS

被引：174

作者：

SRINIVASAN, V

SMRTIC, MA

BABU, SV

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 11期

关键词：

D O I：

10.1063/1.336728

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3861 / 3867

页数：7

共 26 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J].

ARAKAWA, ET ;

WILLIAMS, MW ;

ASHLEY, JC ;

PAINTER, LR .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3579-3582

[3] EXCIMER LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR ;

BAISE, AI ;

BURNS, F ;

KAUFMAN, J .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) :2036-2043

[4]

BRAREN B, 1985, J VAC SCI TECHNOL B, V31, P4077

[5] CONTACT LITHOGRAPHY AT 157 NM WITH AN F2 EXCIMER LASER [J].

CRAIGHEAD, HG ;

WHITE, JC ;

HOWARD, RE ;

JACKEL, LD ;

BEHRINGER, RE ;

SWEENEY, JE ;

EPWORTH, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1186-1189

[6] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].

DEUTSCH, TF ;

GEIS, MW .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204

[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J].

GARRISON, BJ ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1984, 44 (09) :849-851

[8] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J].

GORODETSKY, G ;

KAZYAKA, TG ;

MELCHER, RL ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1985, 46 (09) :828-830

[9] THE THERMAL DEGRADATION OF POLYVINYL COMPOUNDS .3. THE EFFECT OF INHIBITORS AND END GROUPS ON THE DEGRADATION OF POLYMETHYL METHACRYLATE [J].

GRASSIE, N ;

MELVILLE, HW .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1949, 199 (1056) :24-39

[10] RECENT DEVELOPMENTS IN 2-LEVEL RESIST TECHNOLOGY [J].

GRIFFING, BF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1423-1428

← 1 2 3 →