EVIDENCE FOR QUANTUM CONFINEMENT IN POROUS SILICON FROM PHOTOLUMINESCENCE MEASUREMENTS

被引:9
作者
JOSHKIN, VA
NAIDENKOV, MN
PAVLENKO, VN
KVIT, AV
OKTYABRSKY, SR
机构
[1] PN LEBEDEV PHYS INST, MOSCOW 117924, RUSSIA
[2] N CAROLINA STATE UNIV, DEPT MAT SCI & ENGN, RALEIGH, NC 27695 USA
关键词
D O I
10.1103/PhysRevB.52.12102
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the correlation of photoluminescence (PL) properties with certain etching conditions, thermal annealing, and powdering of porous silicon. A blueshift of the PL main peak bas observed with a decrease of the PL intensity. PL quenching in p-Si corresponds to a relaxation or desorption process with the activation energy of 0.37 +/- 0.13 eV. The decrease of the PL efficiency and the shift of the PL main peak to the blue region were investigated as a function of excitation intensity. On the basis of our results we verified some physical models of porous silicon FL. It is shown that the features of porous silicon PL are associated with a quantum confinement effect in silicon nanocrystallites. A model for competing nonradiative and radiative recombination channels is proposed to explain the observed phenomena.
引用
收藏
页码:12102 / 12107
页数:6
相关论文
共 14 条
  • [1] Animalu A. O. E., 1977, INTERMEDIATE QUANTUM
  • [2] A MICROSTRUCTURAL STUDY OF POROUS SILICON
    BERBEZIER, I
    HALIMAOUI, A
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (09) : 5421 - 5425
  • [3] HOMOEPITAXIAL FILMS GROWN ON SI(100) AT 150-DEGREES C BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    BREAUX, L
    ANTHONY, B
    HSU, T
    BANERJEE, S
    TASCH, A
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (18) : 1885 - 1887
  • [4] THEORETICAL ASPECTS OF THE LUMINESCENCE OF POROUS SILICON
    DELERUE, C
    ALLAN, G
    LANNOO, M
    [J]. PHYSICAL REVIEW B, 1993, 48 (15): : 11024 - 11036
  • [5] FINGER F, 1993, MAT RES S C, V283, P471
  • [6] POROUS SILICON AND SILOXENE - VIBRATIONAL AND STRUCTURAL-PROPERTIES
    FUCHS, HD
    STUTZMANN, M
    BRANDT, MS
    ROSENBAUER, M
    WEBER, J
    BREITSCHWERDT, A
    DEAK, P
    CARDONA, M
    [J]. PHYSICAL REVIEW B, 1993, 48 (11): : 8172 - 8183
  • [7] DOPANT-ENHANCED LOW-TEMPERATURE EPITAXIAL-GROWTH OF INSITU DOPED SILICON BY RAPID THERMAL-PROCESSING CHEMICAL VAPOR-DEPOSITION
    HSIEH, TY
    JUNG, KH
    KIM, YM
    KWONG, DL
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (01) : 80 - 82
  • [8] GROWTH OF MICROCRYSTAL SILICON BY REMOTE PLASMA CHEMICAL VAPOR-DEPOSITION
    KIM, SC
    JUNG, MH
    JANG, J
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (03) : 281 - 283
  • [9] MICROLUMINESCENCE DEPTH PROFILES AND ANNEALING EFFECTS IN POROUS SILICON
    PROKES, SM
    FREITAS, JA
    SEARSON, PC
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (26) : 3295 - 3297
  • [10] SYNTHESIS OF LUMINESCENT SILICON CLUSTERS BY SPARK ABLATION
    SAUNDERS, WA
    SERCEL, PC
    LEE, RB
    ATWATER, HA
    VAHALA, KJ
    FLAGAN, RC
    ESCORCIAAPARCIO, EJ
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (11) : 1549 - 1551