SPUTTERING AND ION-SOURCE TECHNOLOGY

被引：19
作者：
ANDERSEN, HH [1 ]
机构：
[1] IBM CORP THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1976年 / 23卷 / 02期
关键词：
D O I：
10.1109/TNS.1976.4328383
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：959 / 966
页数：8
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