RESPONSE OF LITHOGRAPHIC MASK STRUCTURES OF INTENSE REPETITIVELY PULSED X-RAYS - THERMAL-STRESS ANALYSIS

被引：13

作者：

BALLANTYNE, A

HYMAN, H

DYM, CL

SOUTHWORTH, R

机构：

[1] UNIV MASSACHUSETTS,DEPT CIVIL ENGN,AMHERST,MA 01003

[2] AVCO SYST DIV,WILMINGTON,MA 01887

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 12期

关键词：

D O I：

10.1063/1.336245

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4717 / 4725

页数：9

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