COATED SILICAS AND SMALL-ANGLE X-RAY-INTENSITY BEHAVIOR

被引：19

作者：

BENEDETTI, A

CICCARIELLO, S

机构：

[1] DIPARTMENTO FIS G GALILEI,VIA MARZOLO 8,I-35131 PADUA,ITALY

[2] DIPARTIMENTO CHIM FIS,I-30123 VENICE,ITALY

[3] SEZ INFM,I-35131 PADUA,ITALY

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1994年 / 27卷

关键词：

D O I：

10.1107/S0021889893008386

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Porod plots of the small-angle X-ray intensities scattered by porous silicas that have undergone different coating processes show deviations from the predicted constant asymptotic behaviour. The deviations are ascribed to the effect of the coating film. We propose a constant-electron-density model for these films. The theoretical scattering function calculated from the model permits an estimate of the film thickness, electron density and average number of coating molecules per unit area of the support.

引用

收藏

页码：249 / 256

页数：8

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