ROLE OF STRESS ON THE PARABOLIC KINETIC CONSTANT FOR DRY SILICON OXIDATION

被引：59

作者：

FARGEIX, A

GHIBAUDO, G

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 02期

关键词：

D O I：

10.1063/1.333924

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：589 / 591

页数：3

共 11 条

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