OPTICAL AND ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS SI1-XGEX ALLOY THIN-FILMS PREPARED BY PLANAR MAGNETRON SPUTTERING

被引:18
|
作者
SAITO, N
AOKI, K
SANNOMIYA, H
YAMAGUCHI, T
机构
关键词
D O I
10.1016/0040-6090(84)90088-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:253 / 262
页数:10
相关论文
共 50 条
  • [31] OPTICAL AND ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED BY TETRODE RF SPUTTERING
    GEKKA, Y
    FUNABASHI, S
    YASUMURA, Y
    APPLICATIONS OF SURFACE SCIENCE, 1982, 11-2 (JUL): : 528 - 534
  • [32] THE ELECTRICAL AND OPTICAL-PROPERTIES OF THE ZNO-SNO2 THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
    ENOKI, H
    NAKAYAMA, T
    ECHIGOYA, J
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 129 (01): : 181 - 191
  • [33] TEMPERATURE AND BIAS EFFECTS ON THE ELECTRICAL-PROPERTIES OF CDS THIN-FILMS PREPARED BY RF SPUTTERING
    MARTIL, I
    GONZALEZDIAZ, G
    SANCHEZQUESADA, F
    THIN SOLID FILMS, 1984, 114 (04) : 327 - 334
  • [34] ELECTRICAL-PROPERTIES OF AMORPHOUS LITHIUM ELECTROLYTE THIN-FILMS
    BATES, JB
    DUDNEY, NJ
    GRUZALSKI, GR
    ZUHR, RA
    CHOUDHURY, A
    LUCK, CF
    ROBERTSON, JD
    SOLID STATE IONICS, 1992, 53 : 647 - 654
  • [35] PHYSICAL-PROPERTIES OF AMORPHOUS HYDROGENATED SILICON FILMS PREPARED BY MAGNETRON SPUTTERING
    SVANBAEV, EA
    ZHDANOVICH, NS
    ZHERZDEV, AV
    TAURBAEV, TM
    TERUKOV, EI
    INORGANIC MATERIALS, 1987, 23 (05) : 635 - 639
  • [36] A correlation between the microstructure and optical properties of hydrogenated amorphous carbon films prepared by RF magnetron sputtering
    Clin, M
    Darand-Drouhin, O
    Zeinert, A
    Picot, JC
    DIAMOND AND RELATED MATERIALS, 1999, 8 (2-5) : 527 - 531
  • [37] THIN-FILMS OF A-SI1-XGEX-H ALLOYS BY DUAL MAGNETRON SPUTTERING IN A UHV CHAMBER
    RUDDER, RA
    COOK, JW
    LUCOVSKY, G
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 567 - 571
  • [38] THIN-FILMS PREPARED BY SPUTTERING MGF2 IN AN RF PLANAR MAGNETRON
    MARTINU, L
    BIEDERMAN, H
    HOLLAND, L
    VACUUM, 1985, 35 (12) : 531 - 535
  • [39] THIN-FILMS OF SI1-XGEX DEPOSITED USING AN ABLATION TECHNIQUE
    ANTONI, F
    FOGARASSY, E
    FUCHS, C
    PREVOT, B
    STOQUERT, JP
    ANNALES DE PHYSIQUE, 1994, 19 (05) : 39 - 40
  • [40] Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering
    Wei, A. X.
    Ge, Z. X.
    Zhao, X. H.
    Liu, J.
    Zhao, Y.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2011, 509 (41) : 9758 - 9763