DYNAMICS OF DEFECT CREATION BY ION-IMPLANTATION IN THERMAL SIO2

被引：24

作者：

DEVINE, RAB

GOLANSKI, A

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 07期

关键词：

D O I：

10.1063/1.333278

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2738 / 2740

页数：3

共 19 条

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[10]

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