OPTICAL STUDY OF HIGH-DOSE IMPLANTED, LASER ANNEALED SILICON

被引：1
|
作者：
BORGHESI, A [1 ]
GUIZZETTI, G [1 ]
NOSENZO, L [1 ]
STELLA, A [1 ]
CAMPISANO, SU [1 ]
RIMINI, E [1 ]
机构：
[1] UNIV CATANIA, DEPARTIMENTO FIS, I-95129 CATANIA, ITALY
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 19-20卷
关键词：
D O I：
10.1016/S0168-583X(87)80116-7
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：582 / 584
页数：3
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