EPITAXIAL DEPOSITION OF GERMANIUM BY BOTH SPUTTERING AND EVAPORATION

被引：90
作者：
KRIKORIAN, E
SNEED, RJ
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 10期
关键词：
D O I：
10.1063/1.1707902
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3665 / +
页数：1
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