INTRODUCTION TO ION AND PLASMA ETCHING

被引：85

作者：

SOMEKH, S ^{[1
]}

机构：

[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 05期

关键词：

D O I：

10.1116/1.569036

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1003 / 1007

页数：5

共 32 条

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[8]

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[9] EVOLUTION OF WELL-DEFINED SURFACE CONTOUR SUBMITTED TO ION-BOMBARDMENT - COMPUTER-SIMULATION AND EXPERIMENTAL INVESTIGATION [J].

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