KINETICS OF THERMAL OXIDATION OF SILICON IN DRY O2

被引：0
作者：
BURKHARD.PJ
GREGOR, LV
机构：
来源：
JOURNAL OF METALS | 1965年 / 17卷 / 07期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：699 / &
相关论文
共 50 条
  • [41] Kinetics of oxidation of methane in CH4:O2 mixtures
    Ryzhov, VV
    Suslov, AI
    INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS, 1999, : 69 - 70
  • [42] The oxidation kinetics of chromium at high temperature:: The reactions of Cr/O2
    Cheng, JF
    Xu, MH
    Zeng, HC
    Hu, S
    Li, PS
    Qiao, Y
    Feng, R
    ENERGY CONVERSION AND APPLICATION, VOL I AND II, 2001, : 748 - 751
  • [43] The characteristics of interfacial strains developed in silicon by wet O2 oxidation
    Shin, DW
    You, YH
    Choi, DJ
    Kim, GH
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1999, 18 (10) : 755 - 757
  • [44] THERMAL-OXIDATION KINETICS OF SILICON IN A STEADY ELECTRIC-FIELD IN A DRY OXYGEN ATMOSPHERE
    UGAI, YA
    ANOKHIN, VZ
    MITTOVA, IY
    MALEVSKAYA, LA
    BONDARENKO, NS
    ZHURNAL FIZICHESKOI KHIMII, 1981, 55 (10): : 2620 - 2623
  • [45] NONPLANAR SILICON OXIDATION IN DRY O2+NF3
    IMAI, K
    YAMABE, K
    APPLIED PHYSICS LETTERS, 1990, 56 (03) : 280 - 282
  • [46] Oxidation of FeCrAl alloys at 500-900 °C in dry O2
    Josefsson, H
    Liu, F
    Svensson, JE
    Halvarsson, M
    Johansson, LG
    MATERIALS AND CORROSION-WERKSTOFFE UND KORROSION, 2005, 56 (11): : 801 - 805
  • [47] Oxidation of iron at 400-600 °C in dry and wet O2
    Pujilaksono, Bagas
    Jonsson, Torbjorn
    Halvarsson, Mats
    Svensson, Jan-Erik
    Johansson, Lars-Gunnar
    CORROSION SCIENCE, 2010, 52 (05) : 1560 - 1569
  • [48] Kinetics of O2(1Σ) formation in the reaction O2(1Δ) + O2(1Δ) → O2(1Σ) + O2(3Σ)
    Zagidullin, M. V.
    Khvatov, N. A.
    Nyagashkin, A. Yu.
    QUANTUM ELECTRONICS, 2011, 41 (02) : 135 - 138
  • [49] Kinetics of thermal oxidation of silicon nitride powders
    Butt, DP
    Albert, D
    Taylor, TN
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1996, 79 (11) : 2809 - 2814
  • [50] KINETICS THEORY OF THERMAL-OXIDATION OF SILICON
    LU, YZ
    SCIENCE IN CHINA SERIES A-MATHEMATICS PHYSICS ASTRONOMY, 1989, 32 (10): : 1270 - 1280
12345