KINETICS OF THERMAL OXIDATION OF SILICON IN DRY O2

被引：0
作者：
BURKHARD.PJ
GREGOR, LV
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来源：
JOURNAL OF METALS | 1965年 / 17卷 / 07期
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中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
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页码：699 / &
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