KINETICS OF THERMAL OXIDATION OF SILICON IN DRY O2

被引：0
|
作者：
BURKHARD.PJ
GREGOR, LV
机构：
来源：
JOURNAL OF METALS | 1965年 / 17卷 / 07期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：699 / &
相关论文
共 50 条
  • [21] KINETICS OF THERMAL OXIDATION OF SILICON IN O2-N2 MIXTURES AT 1200 DEGREESC
    HESS, DW
    DEAL, BE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (04) : 579 - 581
  • [22] OXIDATION OF TITANIUM NITRIDE IN ROOM AIR AND IN DRY O2
    TOMPKINS, HG
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) : 3876 - 3880
  • [23] Temperature and pressure dependence of the oxygen exchange at the SiO2-Si interface, O2⇆SiO2, during dry thermal oxidation of silicon
    Åkermark, T
    Ganem, JJ
    Trimaille, I
    Vickridge, I
    Rigo, S
    JOURNAL OF PHYSICAL CHEMISTRY B, 1999, 103 (45): : 9910 - 9914
  • [24] KINETICS OF THERMAL-OXIDATION OF SILICON IN O2-H2O AND O2-CL2 MIXTURES
    MONKOWSKI, J
    TRESSLER, RE
    STACH, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (12) : 2083 - 2084
  • [25] Oxidation Kinetics of Impurities in Metallurgical-Grade Silicon Melt by O2 Blowing Refining Process
    Naiyong He
    Ding Yang
    Min Xu
    Jijun Wu
    Kuixian Wei
    Wenhui Ma
    Metallurgical and Materials Transactions B, 2021, 52 : 1830 - 1838
  • [26] Oxidation Kinetics of Impurities in Metallurgical-Grade Silicon Melt by O2 Blowing Refining Process
    He, Naiyong
    Yang, Ding
    Xu, Min
    Wu, Jijun
    Wei, Kuixian
    Ma, Wenhui
    METALLURGICAL AND MATERIALS TRANSACTIONS B-PROCESS METALLURGY AND MATERIALS PROCESSING SCIENCE, 2021, 52 (03): : 1830 - 1838
  • [27] KINETICS OF SILICON ACTIVATED OXIDATION BY DRY OXYGEN
    BELOVA, VM
    ROZOVSKII, AY
    RUBTSOVA, EA
    ZHURNAL FIZICHESKOI KHIMII, 1991, 65 (11): : 3122 - 3125
  • [28] Existence of silicon oxynitride m silicon dioxide grown by rapid thermal oxidation in a mixture of N2/O2
    Ng, ACH
    Xu, J
    Cheung, WY
    Xu, JB
    2003 IEEE CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS, 2003, : 435 - 438
  • [29] Role of O2 on the thermal oxynitridation of silicon in N2O
    Morales-Acevedo, A
    Pérez-Sánchez, GF
    García-Hurtado, MA
    2004 1st International Conference on Electrical and Electronics Engineering (ICEEE), 2004, : 286 - 291
  • [30] Ethanol Oxidation: Kinetics of the α-Hydroxyethyl Radical + O2 Reaction
    da Silva, Gabriel
    Bozzelli, Joseph W.
    Liang, Long
    Farrell, John T.
    JOURNAL OF PHYSICAL CHEMISTRY A, 2009, 113 (31): : 8923 - 8933
12345