Photoelectrochemical behaviour of hydrogenated amorphous silicon (a-Si:H) films

被引:0
|
作者
Wang, BH
Wang, DJ
Zhang, LH
Geng, XH
Sun, ZL
Geng, XH
Sun, ZL
Li, TJ
机构
[1] JILIN UNIV, DEPT CHEM, CHANGCHUN 130023, PEOPLES R CHINA
[2] NANKAI UNIV, INST PHOTOELECTRON, TIANJIN 300071, PEOPLES R CHINA
[3] NANKAI UNIV, INST POTOELECTRON, TIANJIN 300071, PEOPLES R CHINA
来源
CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE | 1995年 / 16卷 / 11期
关键词
hydrogenated amorphous silicon; photoelectrochemistry; photocurrent;
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Photoelectrochemical techniques have been employed in the investigation of p-type, n-type and intrinsic hydrogenated amorphous silicon(a-Si : H) films. The results show that the photocurrent response of the films strongly depends on the doped type electrolyte solution and the redox potential of the redox couples. Intrinsic a-Si : H film yields a stable photocurrent much higher than the p- and n-type ones. Based on the measurements, the energy levels and flatband potential of the intrinsic a-Si : H film are given, and the mechanisms of charge transfer in photoelectrochemical cell (PEC) are discussed.
引用
收藏
页码:172 / 176
页数:5
相关论文
共 50 条
  • [1] Photoelectrochemical behaviour of hydrogenated amorphous silicon(a-Si: H) films
    Wang, Bao-hui
    Wang, De-jun
    Zhang, Li-hua
    Geng, Xin-hua
    Sun, Zhong-lin
    Geng, Xin-hua
    Sun, Zhong-lin
    Li, Tie-jin
    Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities, 1995, 16 (11 suppl):
  • [2] Photoelectrochemical Behaviour of Hydrogenated Amorphous Silicon(a-Si:H) Films
    Wang, B.-H.
    Wang, D.-J.
    Zhang, L.-H.
    Geng, X.-H.
    Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities, 1600, 16 (11-SUP):
  • [3] Hydrogenated Amorphous Silicon (a-Si:H) Colloids
    Harris, Justin T.
    Hueso, Jose L.
    Korgel, Brian A.
    CHEMISTRY OF MATERIALS, 2010, 22 (23) : 6378 - 6383
  • [4] Hydrogen motion in hydrogenated amorphous silicon (a-Si:H)
    Univ of Utah, Salt Lake City, United States
    J Non Cryst Solids, pt 1 (52-55):
  • [5] Hydrogen motion in hydrogenated amorphous silicon (a-Si:H)
    Hari, P
    Taylor, PC
    Street, RA
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 200 : 52 - 55
  • [6] Nanostructure of hydrogenated amorphous silicon (a-Si:H) films studied by nuclear magnetic resonance
    Furman, Gregory
    Sokolovsky, Vladimir
    Panich, Alexander
    Xia, Yang
    JOURNAL OF MAGNETIC RESONANCE, 2023, 350
  • [7] Methodological problems in the calculations on amorphous hydrogenated silicon, a-Si:H
    Sax, AF
    Krüger, T
    COMPUTATIONAL SCIENCE-ICCS 2002, PT III, PROCEEDINGS, 2002, 2331 : 950 - 955
  • [8] Mechanical properties of hydrogenated amorphous silicon (a-Si:H) particles
    Jiang, Taizhi
    Khabaz, Fardin
    Marne, Aniket
    Wu, Chenglin
    Gearba, Raluca
    Bodepudi, Revanth
    Bonnecaze, Roger T.
    Liechti, Kenneth M.
    Korgel, Brian A.
    JOURNAL OF APPLIED PHYSICS, 2019, 126 (20)
  • [9] MEMORY SWITCHING IN SPUTTERED HYDROGENATED AMORPHOUS SILICON (a-Si:H).
    Gangopadhyay, Shubhra
    Geiger, Juergen
    Schroeder, Bernd
    Ruebel, Herbert
    Iselborn, Stefan
    1600, (24):
  • [10] Crystallization of amorphous hydrogenated silicon (a-Si:H) films under irradiation with femtosecond laser pulses
    Belik, V. P.
    Vasyutinskii, O. S.
    Kukin, A. V.
    Petrov, M. A.
    Popov, R. S.
    Terukov, E. I.
    TECHNICAL PHYSICS LETTERS, 2016, 42 (08) : 788 - 791