THE IMPACT OF TECHNOLOGY SCALING ON ESD ROBUSTNESS AND PROTECTION CIRCUIT-DESIGN

被引:27
作者
AMERASEKERA, A
DUVVURY, C
机构
[1] Semiconductor Process and Device Center, Texas Instruments Inc, Dallas
来源
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART A | 1995年 / 18卷 / 02期
关键词
D O I
10.1109/95.390309
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The trends in ESD robustness as a function of technology scaling, for feature sizes down to 0.25 mu m, have been experimentally determined using single finger nMOS transistors and Full ESD protection circuits, It is shown that as feature sizes are reduced, good ESD performance can be obtained provided the negative effects of the shallower junctions are offset by the positive effects of the reduction in the effective channel lengths, Hence, processes and protection circuits with feature sizes as small as 0.25 mu m can be developed without degrading ESD robustness.
引用
收藏
页码:314 / 320
页数:7
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