EFFECTS OF RAPID THERMAL-PROCESSING ON MBE GAAS ON SI

被引：1

作者：

ITO, A

KITAGAWA, A

TOKUDA, Y

USAMI, A

KANO, H

NOGE, H

WADA, T

机构：

来源：

RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING | 1989年 / 146卷

关键词：

D O I：

10.1557/PROC-146-413

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：413 / 418

页数：6

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