EFFECTS OF RAPID THERMAL-PROCESSING ON MBE GAAS ON SI

被引：1
作者：
ITO, A
KITAGAWA, A
TOKUDA, Y
USAMI, A
KANO, H
NOGE, H
WADA, T
机构：
来源：
RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING | 1989年 / 146卷
关键词：
D O I：
10.1557/PROC-146-413
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：413 / 418
页数：6
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