PROPERTIES OF TELLURIUM-DOPED EPITAXIAL BISMUTH-FILMS

被引：12

|

作者：

HEREMANS, J

MORELLI, DT

PARTIN, DL

OLK, CH

THRUSH, CM

PERRY, TA

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 15期

关键词：

D O I：

10.1103/PhysRevB.38.10280

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：10280 / 10284

页数：5

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