PROPERTIES OF TELLURIUM-DOPED EPITAXIAL BISMUTH-FILMS

被引：12
|
作者：
HEREMANS, J
MORELLI, DT
PARTIN, DL
OLK, CH
THRUSH, CM
PERRY, TA
机构：
来源：
PHYSICAL REVIEW B | 1988年 / 38卷 / 15期
关键词：
D O I：
10.1103/PhysRevB.38.10280
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：10280 / 10284
页数：5
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