SURFACE-STRUCTURE OF EPITAXIAL NISI2 GROWN ON SI(001) DETERMINED BY LOW-ENERGY ION-SCATTERING TECHNIQUES

被引：29

作者：

HUANG, JH ^{[1
]}

DALEY, RS ^{[1
]}

SHUH, DK ^{[1
]}

WILLIAMS, RS ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,CTR SOLID STATE SCI,LOS ANGELES,CA 90024

来源：

SURFACE SCIENCE | 1987年 / 186卷 / 1-2期

关键词：

D O I：

10.1016/S0039-6028(87)80038-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：115 / 137

页数：23

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