ELECTRODEPOSITION KINETICS FOR TIN, LEAD, AND TIN-LEAD FLUOBORATE PLATING SOLUTIONS

被引：13
|
作者：
TAM, TM
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 09期
关键词：
D O I：
10.1149/1.2109020
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1792 / 1796
页数：5
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