Preparation and characterization of DC sputtered molybdenum thin films

被引:25
|
作者
Kashyout, Abd El-Hady B. [1 ]
Soliman, Hesham M. A. [1 ]
Abou Gabal, Hanaa [2 ]
Ibrahim, Poussy Aly [1 ]
Fathy, Marwa [1 ]
机构
[1] Mubarak City Sci Res & Technol Applicat, Adv Technol & New Mat Res Inst, POB 21934, Alexandria, Egypt
[2] Univ Alexandria, Fac Engn, Nucl & Radiat Engn Dept, Alexandria 21544, Egypt
关键词
Mo thin films; Mono-crystalline; DC sputtering; Nanomaterials;
D O I
10.1016/j.aej.2011.01.009
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Molybdenum (Mo) thin films have been deposited on soda-lime glass substrates using a DC magnetron sputtering system. Their electrical resistivity, and their morphological, structural and adhesive properties have been examined with respect to the deposition power, deposition time and substrate temperature. The electrical resistivity of the Mo films could be reduced by increasing any of the above parameters. Within the range of the investigated deposition parameters, the films showed a mono-crystalline nature with a preferred orientation along the (1 1 0) plane. The Mo films adhesion to the soda-lime glass could be improved by increasing the substrate temperature. At a deposition power of 200 W, deposition time of 20 min and substrate temperature of 450 degrees C, Mo thin film exhibiting mono-crystalline structure with thickness equal to 450 nm and electrical resistivity equal to 1.85 x 10(-4) Omega cm was obtained. (C) 2011 Faculty of Engineering, Alexandria University. Production and hosting by Elsevier B.V. All rights reserved.
引用
收藏
页码:57 / 63
页数:7
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