ANNEALING BEHAVIOR OF HYDROGEN TRAPS IN NE-IMPLANTED TA

被引：22
作者：
KEINONEN, J
KARTTUNEN, V
RAISANEN, J
BERGMEISTER, FJ
LUUKKAINEN, A
TIKKANEN, P
机构：
来源：
PHYSICAL REVIEW B | 1986年 / 34卷 / 12期
关键词：
D O I：
10.1103/PhysRevB.34.8981
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：8981 / 8984
页数：4
相关论文
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