FAST AND NONDESTRUCTIVE METHOD OF C(V) PROFILING OF THIN SEMICONDUCTOR LAYERS ON AN INSULATING SUBSTRATE

被引:13
作者
BINET, M
机构
[1] LAB ELECTR,3 AVE DESCARTES,94450 LIMEIL BREVANNES,FRANCE
[2] LAB PHYS APPL,94450 LIMEIL BREVANNES,FRANCE
关键词
D O I
10.1049/el:19750444
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:580 / 581
页数:2
相关论文
共 4 条
[1]  
BAUDET P, 1974, CNES73 CONTR
[2]  
DRIVER MC, AD774462 REP
[3]   DETERMINATION OF IMPURITY AND MOBILITY DISTRIBUTIONS IN EPITAXIAL SEMICONDUCTING-FILMS ON INSULATING SUBSTRATE BY C-V AND Q-V ANALYSIS [J].
LEHOVEC, K .
APPLIED PHYSICS LETTERS, 1974, 25 (05) :279-281
[4]   SERIES RESISTANCE EFFECTS IN SEMICONDUCTOR CV PROFILING [J].
WILEY, JD ;
MILLER, GL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (05) :265-272