ELECTRON-SPECTROSCOPY (ESCA) ON TECHNICAL OXIDIC THIN-FILMS PREPARED BY DIFFERENT METHODS

被引：9
作者：
ANDERSON, O
BANGE, K
机构：
[1] SCHOTT Glaswerke, Research and Development, Mainz, W-6500
来源：
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1991年 / 341卷 / 1-2期
关键词：
D O I：
10.1007/BF00322111
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Technical oxidic thin films (SiO2, TiO2, Ta2O5 and WO3) prepared by different deposition methods (dip coating, evaporation and ion plating) have been analysed by electron spectroscopy (ESCA). Different peak structures were obtained in the spectra depending on the deposition technique and the conditions during the coating process. The differences in the spectra due to the binding states were analysed by means of deconvolution and fitting of the spectra. The obtained results are discussed in connection with further investigations.
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页码：74 / 78
页数：5
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