PHOTOELECTROCHEMICAL PROPERTIES OF PLASMA-DEPOSITED TIO2 THIN-FILMS

被引：18
作者：
WILLIAMS, LM
HESS, DW
机构：
[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720
来源：
THIN SOLID FILMS | 1984年 / 115卷 / 01期
关键词：
D O I：
10.1016/0040-6090(84)90311-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：13 / 18
页数：6
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