CHARACTERIZATION OF THIN-FILM INTERFERENCE EFFECT DUE TO SURFACE-ROUGHNESS

被引：4

作者：

NAGATA, H ^{[1
]}

YAMAGUCHI, A ^{[1
]}

KAWAI, A ^{[1
]}

机构：

[1] NAGAOKA UNIV TECHNOL,DEPT ELECT ENGN,NIIGATA 94021,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 7A期

关键词：

PHOTOLITHOGRAPHY; INTERFERENCE EFFECT; PHOTORESIST; REFLECTIVITY; MULTIPLE REFLECTIVITY; DIFFUSE REFLECTANCE; SURFACE ROUGHNESS; SPUTTERING; ALUMINUM; LSI;

D O I：

10.1143/JJAP.34.3754

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The normal and diffuse reflectivity from a resist/aluminum system were measured with various resist thicknesses. The average surface roughness sigma(a) of aluminum surfaces varied from 5.5 to 10.5 nm upon changing the sputtering conditions. The diffuse reflectivity at the air/aluminum interface increases with surface roughness. This tendency is enhanced as the wavelength of incident light decreases. The interference effect for the resist/aluminum system decreases as the surface roughness increases. This tendency is enhanced when the resist absorptivity decreased. These results are analyzed with using the help of the ''Swing'' model.

引用

页码：3754 / 3758

页数：5

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