ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER

被引：101

作者：

MANGANO, JA ^{[1
]}

JACOB, JH ^{[1
]}

机构：

[1] AVCO EVERETT RES LAB,EVERETT,MA 02149

来源：

APPLIED PHYSICS LETTERS | 1975年 / 27卷 / 09期

关键词：

D O I：

10.1063/1.88547

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：495 / 498

页数：4

共 10 条

[1] 354-NM LASER ACTION ON XEF [J].

BRAU, CA ;

EWING, JJ .

APPLIED PHYSICS LETTERS, 1975, 27 (08) :435-437

[2]

BRAU CA, TO BE PUBLISHED

[3]

CALVERT JG, 1966, PHOTOCHEMISTRY, P184

[4]

EWING J, COMMUNICATION

[5] EMISSION-SPECTRUM OF XEI IN ELECTRON-BEAM-EXCITED XE-I2 MIXTURES [J].

EWING, JJ ;

BRAU, CA .

PHYSICAL REVIEW A, 1975, 12 (01) :129-132

[6] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

[7]

HILL RM, 1974, MP7439 STANF RES I R

[8]

MANGANO JA, UNPUBLISHED

[9] STIMULATED EMISSION AT 281.8 NM FROM XEBR [J].

SEARLES, SK ;

HART, GA .

APPLIED PHYSICS LETTERS, 1975, 27 (04) :243-245

[10] BOUND-FREE EMISSION-SPECTRA OF DIATOMIC XENON HALIDES [J].

VELAZCO, JE ;

SETSER, DW .

JOURNAL OF CHEMICAL PHYSICS, 1975, 62 (05) :1990-1991

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