DIRECT WRITING OF GAAS MONOLAYERS BY LASER-ASSISTED ATOMIC LAYER EPITAXY

被引:37
作者
KARAM, NH
LIU, H
YOSHIDA, I
BEDAIR, SM
机构
关键词
D O I
10.1063/1.99186
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1144 / 1146
页数:3
相关论文
共 13 条
[1]   LASER SELECTIVE DEPOSITION OF GAAS ON SI [J].
BEDAIR, SM ;
WHISNANT, JK ;
KARAM, NH ;
TISCHLER, MA ;
KATSUYAMA, T .
APPLIED PHYSICS LETTERS, 1986, 48 (02) :174-176
[2]   ATOMIC LAYER EPITAXY OF III-V BINARY COMPOUNDS [J].
BEDAIR, SM ;
TISCHLER, MA ;
KATSUYAMA, T ;
ELMASRY, NA .
APPLIED PHYSICS LETTERS, 1985, 47 (01) :51-53
[3]  
DOI A, 1986, APPL PHYS LETT, V49, P785, DOI 10.1063/1.97546
[4]   LASER DIRECT WRITING OF SINGLE-CRYSTAL III-V COMPOUNDS ON GAAS [J].
KARAM, NH ;
ELMASRY, NA ;
BEDAIR, SM .
APPLIED PHYSICS LETTERS, 1986, 49 (14) :880-882
[5]  
KARAM NH, 1987, MATER RES SOC S P, V75, P241
[6]  
KARAM NH, 1986, C SERIES, V83, P171
[7]  
LINDLEY WT, 1986, C SERIES, V83, P135
[8]  
SCHLYER DJ, 1976, J ORGANOMET CHEM, V114, P9
[9]  
TISCHLER M, 1986, 13TH INT S GAAS REL
[10]   SELF-LIMITING MECHANISM IN THE ATOMIC LAYER EPITAXY OF GAAS [J].
TISCHLER, MA ;
BEDAIR, SM .
APPLIED PHYSICS LETTERS, 1986, 48 (24) :1681-1683