COMPARISON OF FINITE-ELEMENT CALCULATIONS AND EXPERIMENTAL MEASUREMENTS IN EDGE-DEFINED FILM-FED GROWTH OF SILICON SHEETS

被引：10

作者：

ETTOUNEY, HM ^{[1
]}

KALEJS, JP ^{[1
]}

BROWN, RA ^{[1
]}

机构：

[1] MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139

来源：

JOURNAL OF CRYSTAL GROWTH | 1984年 / 70卷 / 1-2期

关键词：

D O I：

10.1016/0022-0248(84)90279-3

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：306 / 313

页数：8

相关论文

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