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BUFFER-LAYER TECHNIQUE FOR THE GROWTH OF SINGLE-CRYSTAL SIC ON SI
被引:131
作者
:
ADDAMIANO, A
论文数:
0
引用数:
0
h-index:
0
ADDAMIANO, A
SPRAGUE, JA
论文数:
0
引用数:
0
h-index:
0
SPRAGUE, JA
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1984年
/ 44卷
/ 05期
关键词
:
D O I
:
10.1063/1.94820
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:525 / 527
页数:3
相关论文
共 12 条
[1]
THE FORMATION OF BETA-SIC ON SI
BALOG, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BALOG, M
REISMAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
REISMAN, A
BERKENBLIT, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BERKENBLIT, M
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1980,
9
(03)
: 669
-
683
[2]
de Ridder R., 1970, Physica Status Solidi, V42, P645, DOI 10.1002/pssb.19700420218
[3]
JACKSON DM, 1965, T METALL SOC AIME, V233, P468
[4]
FORMATION OF EPITAXIAL BETA-SIC FILMS ON SAPPHIRE
KHAN, IH
论文数:
0
引用数:
0
h-index:
0
机构:
NASA/Electronics Research Center, Cambridge
KHAN, IH
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
NASA/Electronics Research Center, Cambridge
LEARN, AJ
[J].
APPLIED PHYSICS LETTERS,
1969,
15
(12)
: 410
-
&
[5]
CHEMICAL VAPOR-DEPOSITION OF SINGLE CRYSTALLINE BETA-SIC FILMS ON SILICON SUBSTRATE WITH SPUTTERED SIC INTERMEDIATE LAYER
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
HAZUKI, Y
论文数:
0
引用数:
0
h-index:
0
HAZUKI, Y
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
MATSUNAMI, H
TANAKA, T
论文数:
0
引用数:
0
h-index:
0
TANAKA, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(12)
: 2674
-
2680
[6]
PRODUCTION OF LARGE-AREA SINGLE-CRYSTAL WAFERS OF CUBIC SIC FOR SEMICONDUCTOR-DEVICES
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
POWELL, JA
论文数:
0
引用数:
0
h-index:
0
POWELL, JA
WILL, HA
论文数:
0
引用数:
0
h-index:
0
WILL, HA
[J].
APPLIED PHYSICS LETTERS,
1983,
42
(05)
: 460
-
462
[7]
CHEMICAL VAPOR-DEPOSITION OF SINGLE-CRYSTALLINE ZNO FILM WITH SMOOTH SURFACE ON INTERMEDIATELY SPUTTERED ZNO THIN-FILM ON SAPPHIRE
OHNISHI, S
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
OHNISHI, S
HIROKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
HIROKAWA, Y
论文数:
引用数:
h-index:
机构:
SHIOSAKI, T
KAWABATA, A
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KAWABATA, A
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1978,
17
(05)
: 773
-
778
[8]
THERMAL-EXPANSION OF SOME DIAMOND-LIKE CRYSTALS
SLACK, GA
论文数:
0
引用数:
0
h-index:
0
机构:
GE,RES & DEV CTR,SCHENECTADY,NY 12301
GE,RES & DEV CTR,SCHENECTADY,NY 12301
SLACK, GA
BARTRAM, SF
论文数:
0
引用数:
0
h-index:
0
机构:
GE,RES & DEV CTR,SCHENECTADY,NY 12301
GE,RES & DEV CTR,SCHENECTADY,NY 12301
BARTRAM, SF
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(01)
: 89
-
98
[9]
SPITZER WG, 1959, INT C SILICON CARBID, P347
[10]
SPRAGUE JA, 1975, 33RD P M EL MICR SOC, P162
←
1
2
→
共 12 条
[1]
THE FORMATION OF BETA-SIC ON SI
BALOG, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BALOG, M
REISMAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
REISMAN, A
BERKENBLIT, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BERKENBLIT, M
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1980,
9
(03)
: 669
-
683
[2]
de Ridder R., 1970, Physica Status Solidi, V42, P645, DOI 10.1002/pssb.19700420218
[3]
JACKSON DM, 1965, T METALL SOC AIME, V233, P468
[4]
FORMATION OF EPITAXIAL BETA-SIC FILMS ON SAPPHIRE
KHAN, IH
论文数:
0
引用数:
0
h-index:
0
机构:
NASA/Electronics Research Center, Cambridge
KHAN, IH
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
NASA/Electronics Research Center, Cambridge
LEARN, AJ
[J].
APPLIED PHYSICS LETTERS,
1969,
15
(12)
: 410
-
&
[5]
CHEMICAL VAPOR-DEPOSITION OF SINGLE CRYSTALLINE BETA-SIC FILMS ON SILICON SUBSTRATE WITH SPUTTERED SIC INTERMEDIATE LAYER
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
HAZUKI, Y
论文数:
0
引用数:
0
h-index:
0
HAZUKI, Y
MATSUNAMI, H
论文数:
0
引用数:
0
h-index:
0
MATSUNAMI, H
TANAKA, T
论文数:
0
引用数:
0
h-index:
0
TANAKA, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(12)
: 2674
-
2680
[6]
PRODUCTION OF LARGE-AREA SINGLE-CRYSTAL WAFERS OF CUBIC SIC FOR SEMICONDUCTOR-DEVICES
NISHINO, S
论文数:
0
引用数:
0
h-index:
0
NISHINO, S
POWELL, JA
论文数:
0
引用数:
0
h-index:
0
POWELL, JA
WILL, HA
论文数:
0
引用数:
0
h-index:
0
WILL, HA
[J].
APPLIED PHYSICS LETTERS,
1983,
42
(05)
: 460
-
462
[7]
CHEMICAL VAPOR-DEPOSITION OF SINGLE-CRYSTALLINE ZNO FILM WITH SMOOTH SURFACE ON INTERMEDIATELY SPUTTERED ZNO THIN-FILM ON SAPPHIRE
OHNISHI, S
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
OHNISHI, S
HIROKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
HIROKAWA, Y
论文数:
引用数:
h-index:
机构:
SHIOSAKI, T
KAWABATA, A
论文数:
0
引用数:
0
h-index:
0
机构:
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
KAWABATA, A
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1978,
17
(05)
: 773
-
778
[8]
THERMAL-EXPANSION OF SOME DIAMOND-LIKE CRYSTALS
SLACK, GA
论文数:
0
引用数:
0
h-index:
0
机构:
GE,RES & DEV CTR,SCHENECTADY,NY 12301
GE,RES & DEV CTR,SCHENECTADY,NY 12301
SLACK, GA
BARTRAM, SF
论文数:
0
引用数:
0
h-index:
0
机构:
GE,RES & DEV CTR,SCHENECTADY,NY 12301
GE,RES & DEV CTR,SCHENECTADY,NY 12301
BARTRAM, SF
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(01)
: 89
-
98
[9]
SPITZER WG, 1959, INT C SILICON CARBID, P347
[10]
SPRAGUE JA, 1975, 33RD P M EL MICR SOC, P162
←
1
2
→