PREPARATION AND CHARACTERIZATION OF COPPER(II) OXIDE THIN-FILMS GROWN BY A NOVEL SPRAY PYROLYSIS METHOD

被引：35

作者：

DESISTO, W

SOSNOWSKI, M

SMITH, F

DELUCA, J

KERSHAW, R

DWIGHT, K

WOLD, A

机构：

[1] BROWN UNIV,DEPT CHEM,PROVIDENCE,RI 02912

[2] GE,SCHENECTADY,NY 12345

来源：

MATERIALS RESEARCH BULLETIN | 1989年 / 24卷 / 06期

关键词：

D O I：

10.1016/0025-5408(89)90093-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：753 / 760

页数：8

共 8 条

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[2]

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[3] EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS [J].

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SLABY, M .

THIN SOLID FILMS, 1982, 88 (01) :33-39

[4]

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[5] PREPARATION AND CHARACTERIZATION OF THIN-FILMS OF COPPER(II) OXIDE BY LOW-TEMPERATURE NORMAL PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

LAURIE, AB ;

NORTON, ML .

MATERIALS RESEARCH BULLETIN, 1989, 24 (02) :213-219

[6] SPRAY PYROLYSIS PROCESSING [J].

MOONEY, JB ;

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ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 :81-101

[7]

Van der Pauw L.J., 1958, PHILIPS RES REP, V13, P1

[8] CHEMICAL VAPOR-DEPOSITION AT LOW-TEMPERATURES [J].

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