GROWTH OF HYDROGENATED GERMANIUM MICRO-CRYSTAL BY REACTIVE SPUTTERING

被引：13

作者：

IMURA, T ^{[1
]}

TASHIRO, M ^{[1
]}

OHBIKI, T ^{[1
]}

TERAUCHI, H ^{[1
]}

HIRAKI, A ^{[1
]}

TSUJI, K ^{[1
]}

MINOMURA, S ^{[1
]}

机构：

[1] UNIV TOKYO,INST SOLID STATE PHYS,TOKYO 106,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 08期

关键词：

D O I：

10.1143/JJAP.22.L505

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Semiconducting germanium

引用

页码：L505 / L507

页数：3

共 11 条

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