INCIDENCE ANGLE EFFECT OF A HYDROGEN PLASMA BEAM FOR THE CLEANING OF SEMICONDUCTOR SURFACES

被引：48

作者：

SUEMUNE, I

KUNITSUGU, Y

KAN, Y

YAMANISHI, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 08期

关键词：

D O I：

10.1063/1.101798

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：760 / 762

页数：3

共 12 条

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