SUBSTANTIAL H-ATOM PRODUCTION FROM THE 193 NM PHOTOLYSIS OF TRIETHYLALUMINUM

被引:12
作者
BRUM, JL
DESHMUKH, S
KOPLITZ, B
机构
[1] Department of Chemistry, Tulane University, New Orleans
关键词
D O I
10.1016/0009-2614(90)85451-H
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The 193 nm irradiation of triethylaluminum (TEA) produces a significant amount of atomic hydrogen. Doppler profiles at Lyman-α (121.6 nm) reveal that the H atoms have little kinetic energy, the mean kinetic energy being ≤ 0.35 eV. These observations are interpreted in the context of possible photodissociation pathways. The most likely route involves a single-photon absorption followed by dissociation to form the ethyl radical, which can further dissociate to produce C2H4 and H. © 1990.
引用
收藏
页码:413 / 416
页数:4
相关论文
共 14 条
[1]  
BAUERLE D, 1984, SPRINGER SERIES CHEM, V39
[2]  
BRUM JL, UNPUB APPL PHYS LETT
[3]  
DONNELLY VM, 1987, PHOTON BEAM PLASMA S, V75
[4]  
FIC V, 1966, CHEM PRUM, V16, P607
[5]   NH3 AS A PHOTOSENSITIZER IN THE EPITAXIAL-GROWTH OF GE ON GAAS BY LASER PHOTOCHEMICAL VAPOR-DEPOSITION [J].
KIELY, CJ ;
TAVITIAN, V ;
JONES, C ;
EDEN, JG .
APPLIED PHYSICS LETTERS, 1989, 55 (01) :65-67
[6]   PRODUCT ENERGY-DISTRIBUTIONS FROM THE 193 NM PHOTODISSOCIATION OF NH3 [J].
KOPLITZ, B ;
XU, Z ;
WITTIG, C .
CHEMICAL PHYSICS LETTERS, 1987, 137 (06) :505-509
[7]   RECOLLECTIONS AND REFLECTIONS OF MO-CVD [J].
MANASEVIT, HM .
JOURNAL OF CRYSTAL GROWTH, 1981, 55 (01) :1-9
[8]   THE ETHYL RADICAL - PHOTOIONIZATION AND THEORETICAL-STUDIES [J].
RUSCIC, B ;
BERKOWITZ, J ;
CURTISS, LA ;
POPLE, JA .
JOURNAL OF CHEMICAL PHYSICS, 1989, 91 (01) :114-121
[9]   OBSERVATIONS ON INTENSITY OSCILLATIONS IN REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION DURING CHEMICAL BEAM EPITAXY [J].
TSANG, WT ;
CHIU, TH ;
CUNNINGHAM, JE ;
ROBERTSON, A .
APPLIED PHYSICS LETTERS, 1987, 50 (19) :1376-1378
[10]   RESONANT 2 PHOTON IONIZATION OF H-ATOM AND D-ATOM [J].
ZACHARIAS, H ;
ROTTKE, H ;
DANON, J ;
WELGE, KH .
OPTICS COMMUNICATIONS, 1981, 37 (01) :15-19