EFFECT OF ELECTRIC-FIELD ON HOLE CAPTURE IN SILICON MOS STRUCTURES

被引:0
作者
AKULOV, AF
AFANAS'EV, VV
机构
来源
PISMA V ZHURNAL TEKHNICHESKOI FIZIKI | 1992年 / 18卷 / 19期
关键词
D O I
暂无
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:21 / 24
页数:4
相关论文
共 6 条
[1]  
ADAMCHUK VK, 1990, PHYS STATUS SOLIDI A, P347
[2]  
ADAMCHUK VK, 1988, POVERKHNOST, V12, P5
[3]  
ADAMCHUK VK, 1988, POVERKHNOST, V9, P147
[4]  
LITOVCHENKO VG, 1978, OSNOVY FIZIKI MIKROE
[5]   HOLE PHOTOCURRENTS AND ELECTRON TUNNEL INJECTION INDUCED BY TRAPPED HOLES IN SIO2-FILMS [J].
POWELL, RJ .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) :4557-4563
[6]   EFFECTS OF THERMAL NITRIDATION ON THE TRAPPING CHARACTERISTICS OF SIO2-FILMS [J].
YANKOVA, A ;
THANH, LD ;
BALK, P .
SOLID-STATE ELECTRONICS, 1987, 30 (09) :939-946