LOWERING OF INITIAL ANODIZING CURRENT-DENSITY DUE TO THIN ALUMINUM-OXIDE FILM ON EVAPORATED ALUMINUM

被引：0
作者：
KIKUCHI, A
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来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 01期
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D O I：
10.1143/JJAP.24.L45
中图分类号：
O59 [应用物理学];
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页码：L45 / L46
页数：2
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  • [3] OXIDATION OF VAPOR DEPOSITED ALUMINUM IN AIR AT 23 DEGREES C
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    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (08) : 1375 - +
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