OVERDENSE PLASMAS PRODUCED BY ELECTRON-CYCLOTRON HEATING IN A LINEAR MULTIPOLE

被引：3

作者：

FUKAO, M

MATSUURA, K

机构：

[1] Department of Electrical Engineering, Shizuoka University, Hamamatsu, 432

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期

关键词：

ECH; MULTIPOLE; OVERDENSE; FIELD FREE; UNIFORM; EVANESCENT MODE;

D O I：

10.1143/JJAP.33.4232

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A report is given of characteristics of a plasma produced by electron cyclotron heating (ECH) in a linear multipole (LMP) field configuration. The electron density measured by a 6 mm microwave interferometer reached 2 x 10(12) cm(-3), which corresponds to 30 times the cutoff density for the 2.45 GHz RF source. On the basis of the spatial distributions of electron density, electron temperature and space potential measured with Langmuir and emissive probes, the mechanism of overdense plasma production is discussed. Consideration is also given to steady operation of this configuration, which is essential for practical plasma process applications.

引用

页码：4232 / 4235

页数：4