ELECTRON-BEAM EXPOSURE OF NEGATIVE RESISTS

被引：0

|

作者：

ERSOY, O ^{[1
]}

机构：

[1] CENT INST IND RES,OSLO,NORWAY

来源：

OPTIK | 1976年 / 45卷 / 04期

关键词：

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：345 / 353

页数：9

相关论文

共 50 条

[31] THEORETICAL CONSIDERATIONS ON SENSITIVITIES OF ELECTRON-BEAM RESISTS
TSUDA, M
OIKAWA, S
SUZUKI, A
POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06): : 390 - 395
[32] A NOVEL TECHNIQUE FOR DETERMINING RADIATION CHEMICAL-YIELDS OF NEGATIVE ELECTRON-BEAM RESISTS
NOVEMBRE, AE
BOWMER, TN
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1984, 187 (APR): : 168 - POLY
[33] THE COMPARATIVE-ASSESSMENT OF STRUCTURALLY RELATED NEGATIVE-WORKING ELECTRON-BEAM RESISTS
GRIFFITHS, LG
JONES, RG
BRAMBLEY, DR
POLYMER COMMUNICATIONS, 1988, 29 (06): : 173 - 174
[34] A NOVEL TECHNIQUE FOR DETERMINING RADIATION CHEMICAL-YIELDS OF NEGATIVE ELECTRON-BEAM RESISTS
NOVEMBRE, A
BOWMER, TN
ACS SYMPOSIUM SERIES, 1984, 266 : 241 - 254
[35] CROSS-LINKING IN HALOGEN-CONTAINING NOVOLAC ELECTRON-BEAM NEGATIVE RESISTS
LAMPE, IV
REINHARDT, M
POLYMER ENGINEERING AND SCIENCE, 1995, 35 (02): : 180 - 183
[36] CHARACTERIZATION OF NEGATIVE ELECTRON-BEAM RESISTS BASED UPON GENERALIZED GEL FORMATION THEORY
KOBAYASHI, T
ARAI, E
JOURNAL OF APPLIED PHYSICS, 1981, 52 (07) : 4785 - 4791
[37] Molecular Design for New Positive Electron-Beam Resists
Nagasaki, Yukio
ACS Symposium Series, 706 : 276 - 289
[38] ELECTRON-BEAM AND X-RAY RESISTS FOR MICROLITHOGRAPHY
ERANIAN, A
BERNARD, F
DUBOIS, JC
MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1989, 24 : 41 - 65
[39] IMAGE DEFINITION IN HALOGENATED POLYSTYRENE ELECTRON-BEAM RESISTS
BRAULT, RG
JENSEN, JE
GRANGER, DD
VANAST, CI
MILLER, LJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (06) : C233 - C233
[40] POSITIVE RESISTS FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY
GOZDZ, AS
SOLID STATE TECHNOLOGY, 1987, 30 (06) : 75 - 79

← 1 2 3 4 5 →