ELECTRON-BEAM EXPOSURE OF NEGATIVE RESISTS

被引：0

|

作者：

ERSOY, O ^{[1
]}

机构：

[1] CENT INST IND RES,OSLO,NORWAY

来源：

OPTIK | 1976年 / 45卷 / 04期

关键词：

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

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页码：345 / 353

页数：9

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